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OAI 掩膜光刻機 Model 6000型的特點和優(yōu)點
•高吞吐量(180 wph,**掩模模式)和生產(chǎn)和研發(fā)的*低運行成本
•ABO光學與光均質(zhì)器,以實現(xiàn)所需各種電阻的分辨率和曝光
•用于大深度Foucs的特殊光學
•靈活處理基板從2“平方到12”平方
•可手動或自動上料
配置。
•系統(tǒng)配置頂部和/或底部側(cè)面/ IR 自動對準Vision ProR軟件
•適用于各種基材尺寸和類型
•基于Windows的軟件
•菜單驅(qū)動的GUI與工藝配方存儲
•全場曝光,提高吞吐量
•頂部加載口罩支架,方便,快速,安全的口罩更換
•可選全球調(diào)平零接觸處理
•雙臂4軸機器人搬運系統(tǒng)(可選)
•自調(diào)平工裝隔振
•**的服務(wù)支持(約95%的服務(wù)水平)
Mask Aligner - Model 6000 Features and Benefits
• High throughput (180 wph, first mask mode) and Lowest Cost of operation for production and R&D
• ABO Optics with light homogenizer to achieve required resolutions & exposures for various resists
• Special Optics for Large Depth of Foucs
• Flexibility with substrate handling from 2”sq to 12”sq
• Comes in manual loading or automated loading configurations.
• System configuration with top and/or bottom side / IR auto alignment with Cognex Vision ProR Software
• Adaptable to various substrate sizes and types
• Windows based software
• Menu driven GUI with process recipe storage
• Full field exposure for higher throughput
• Top load mask holder for easy, fast and safe mask replacements
• Optional Global leveling for zero contact processing
• Dual arm 4-axis robot handling system (optional)
• Self leveling tooling vibration isolation
• Superior service support (~95% service level)
XRD-晶向定位
CVD 真空化學氣相沉積設(shè)備
等離子體增強化學氣相沉積系統(tǒng)CVD
自動劃片機
BTF-1200C-RTP-CVD
Gasboard-2060
Pentagon Qlll
定制-電漿輔助化學氣相沉積系統(tǒng)-詳情15345079037
等離子化學氣相沉積系統(tǒng)-PECVD
HSE系列等離子刻蝕機