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儀器簡介：

Recently Refurbished

New Software， Control Hardware，

Dry Process Pump， Dry Loadlock

Pump and Heater Assembly.

技術參數(shù)：

Wafer capacity: Three two inch wafers.

Load lock: Loadlock chamber with hepa filter loading area.

Heater: Single zone graphite heater

Temperature control: Temperature monitor single point T/C， Eurotherm controller， single point

Sekidenko Pyrometer.

Group III MO sources: TMGa - 2 units; TMIn - 2 units; TMAl -2 units

Group V hydride sources: AsH3 -2 lines; PH3 -2 line.

Dopants MO: CP2Mg -1 unit， DeZn - 1 unit

Dopants Hydride: H2/SiH4 - 2 lines

Neslab bath: 6 units.

Piezocon: Single channel concentration monitor for TMIn expandable to Four channels (option).

Pump: EBARA A30;

Exhaust system: particle filter/ housing; Phosphorus trap; P-trap automatic regeneration system

(option).

Gas Monitoring: CM4 4 point toxic gasmonitor.(integration option)

Software: Windows based control software.